Generation of a Metal Ion Beam Using a Vacuum Magnetron Discharge

We have designed, fabricated and characterized an ion source based on a vacuum magnetron discharge. The discharge is initiated by arc discharge, the plasma of which flows onto sputtering target working surface. material usually same as that target. discharges operate at residual pressure 3 × 10−6 Torr without gas feed. Pulses (30 μs) (up to 300 are applied simultaneously. After ignition arc, runs in self-sustained mode. Cu–Cu, Ag–Ag, Zn–Zn, Pb–Pb pairs cathode were tested, well mixed pairs; for example, Cu Pb An beam was extracted from applying accelerating voltage up 20 kV between expander grounded electrodes. collector current reached 80 mA. composition, analyzed time-of-flight spectrometer, shows consists mainly singly-charged (about 90%) doubly-charged 10% fraction) ions. radial density non-uniformity low ±5% over diameter 6.6 cm, output aperture.